Babysitter cleanroom-metrology-controller
Nanofabrication metrology skill for process control with CD-SEM, ellipsometry, and profilometry
install
source · Clone the upstream repo
git clone https://github.com/a5c-ai/babysitter
Claude Code · Install into ~/.claude/skills/
T=$(mktemp -d) && git clone --depth=1 https://github.com/a5c-ai/babysitter "$T" && mkdir -p ~/.claude/skills && cp -r "$T/library/specializations/domains/science/nanotechnology/skills/cleanroom-metrology-controller" ~/.claude/skills/a5c-ai-babysitter-cleanroom-metrology-controller && rm -rf "$T"
manifest:
library/specializations/domains/science/nanotechnology/skills/cleanroom-metrology-controller/SKILL.mdsource content
Cleanroom Metrology Controller
Purpose
The Cleanroom Metrology Controller skill provides comprehensive in-line metrology for nanofabrication process control, enabling precise measurement and monitoring of critical dimensions, film thicknesses, and pattern quality.
Capabilities
- CD-SEM measurement recipes
- Spectroscopic ellipsometry analysis
- Film thickness mapping
- Surface profilometry
- Defect inspection
- Overlay measurement
Usage Guidelines
Metrology Control
-
CD-SEM Measurements
- Develop automated recipes
- Calibrate against reference
- Track process variation
-
Ellipsometry
- Select appropriate model
- Map thickness uniformity
- Characterize optical constants
-
Defect Inspection
- Set detection thresholds
- Classify defect types
- Track yield trends
Process Integration
- All fabrication processes
- Analysis Pipeline Validation
Input Schema
{ "measurement_type": "cd_sem|ellipsometry|profilometry|defect", "target_parameter": "string", "wafer_map": {"sites": "number", "pattern": "string"}, "specification": { "target": "number", "tolerance": "number" } }
Output Schema
{ "measurements": [{ "site": "string", "value": "number", "unit": "string" }], "statistics": { "mean": "number", "std_dev": "number", "range": "number" }, "uniformity": "number (%)", "pass_fail": "boolean", "trending_data": {"dates": [], "values": []} }