Babysitter cvd-pvd-process-controller

Chemical/Physical Vapor Deposition skill for thin film and nanostructure deposition optimization

install

source · Clone the upstream repo

git clone https://github.com/a5c-ai/babysitter

Claude Code · Install into ~/.claude/skills/

T=$(mktemp -d) && git clone --depth=1 https://github.com/a5c-ai/babysitter "$T" && mkdir -p ~/.claude/skills && cp -r "$T/library/specializations/domains/science/nanotechnology/skills/cvd-pvd-process-controller" ~/.claude/skills/a5c-ai-babysitter-cvd-pvd-process-controller && rm -rf "$T"

manifest: library/specializations/domains/science/nanotechnology/skills/cvd-pvd-process-controller/SKILL.md

CVD-PVD Process Controller

Purpose

The CVD-PVD Process Controller skill provides comprehensive vapor deposition process control for thin film and nanostructure fabrication, enabling optimized growth conditions for various material systems.

Capabilities

CVD precursor chemistry selection
Temperature and pressure optimization
Plasma-enhanced CVD protocols
PVD sputtering/evaporation control
Film stress management
Rate and uniformity optimization

Usage Guidelines

Deposition Process Control

CVD Optimization
- Select precursor chemistry
- Optimize flow rates
- Control temperature profile
PVD Control
- Optimize sputter power
- Control deposition rate
- Manage film stress
Quality Assurance
- Monitor thickness in-situ
- Characterize composition
- Verify stoichiometry

Process Integration

Thin Film Deposition Process Optimization
Nanodevice Integration Process Flow

Input Schema

{
  "deposition_type": "cvd|pecvd|sputtering|evaporation",
  "material": "string",
  "target_thickness": "number (nm)",
  "substrate": "string",
  "quality_requirements": {
    "uniformity": "number (%)",
    "stress": "string (tensile|compressive|neutral)"
  }
}

Output Schema

{
  "process_parameters": {
    "temperature": "number (C)",
    "pressure": "number (mTorr)",
    "power": "number (W)",
    "gas_flows": [{"gas": "string", "flow": "number (sccm)"}]
  },
  "deposition_rate": "number (nm/min)",
  "uniformity": "number (%)",
  "film_stress": "number (MPa)",
  "composition": [{"element": "string", "fraction": "number"}]
}